Wang resin,100-200 mesh particle size, extent of labeling: 1.1 mmol/g loading
3,3-Dimethyl-2-butanol,98%
N-Isopropylbenzylamine,97%
5-Bromosalicylaldehyde,98%
2-Bromobenzoic acid,97%
1,2,3-Trimethoxybenzene,98%
D-(-)-Quinic acid,98%
1,8-Diazabicyclo[5.4.0]undec-7-ene,98%
Cyclohexyl phenyl ketone,98%
Hexafluoroacetone trihydrate,98%
1,3,5-Tribromobenzene,98%
Chloromethyl pivalate,97%










![1,8-Diazabicyclo[5.4.0]undec-7-ene, 98%](https://www.levanchimica.it/wp-content/uploads/2023/02/12111-18-Diazabicyclo5.4.0undec-7-ene-98.jpg)



